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电子行业光刻机深度：筚路蓝缕，寻光刻星火-20230908-中航证券

◼ 光刻为IC制造核心工艺，光刻技术的演进成就了摩尔定律。光刻工艺占IC制造1/2的时间+1/3的成本，在瑞利公式：???? = ??1??/???? 的指导下，人类在缩短波长??，增大数值孔径NA，降低工艺因子??1三个方面展开探索，目前已实现13.5nm波长与达物理极限的??1 ，正在向0.55NA EUV迈步。为了实现进一步制程微缩，业界多采用多重曝光工艺，但对光刻机的套刻精度、图形畸变、稳

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